11
2023
-
09
Different types of MPCVD diamond deposition equipment and systems
Author:
Rectangular quartz‑tube MPCVD is one of the earliest diamond‑deposition systems. Due to the direct contact between the quartz tube and the plasma, this configuration suffers from poor heat dissipation and severe etching, making it difficult to achieve high‑power diamond deposition. As a result, it has largely been phased out.
Rectangular quartz-tube MPCVD is one of the earlier types to have emerged. Diamond deposition equipment . Rectangular quartz-tube MPCVD Diamond deposition equipment Because the reactor design places the quartz tube in direct contact with the plasma, it suffers from poor heat dissipation and severe etching, making it difficult to achieve high‑power diamond deposition. Consequently, this configuration has largely been abandoned.

The design of the chamber in the ellipsoidal resonant cavity MPCVD diamond deposition system is primarily based on the principle that an ellipsoid has two foci. In this ellipsoidal resonant cavity, microwaves are fed into one focus via an antenna, generating a stable electric field at the other focus. A quartz bell jar is positioned at the lower focus, and a water-cooled substrate holder is placed inside it; the plasma is ignited at the focal point within the quartz bell jar.
Ellipsoidal Resonant Cavity MPCVD Diamond deposition equipment Advantages of the device: The intensity and spatial position of the excited plasma are highly stable; regardless of changes in gas pressure or microwave power, the plasma remains consistently above the substrate holder and maintains good contact with it. Moreover, the coupling efficiency between the microwave field and the plasma is exceptionally high, eliminating the need for additional components to match the system’s impedance. Compared with cylindrical‑cavity MPCVD systems, the ellipsoidal‑cavity MPCVD configuration is better suited to high‑power, high‑pressure diamond deposition conditions. However, the ellipsoidal cavity has a larger footprint, and its use of a quartz bell jar to enclose the substrate holder poses challenges for system cooling, thereby limiting its practical applications to some extent.
Compared with other types of MPCVD diamond deposition systems, the cylindrical‑cavity MPCVD reactor offers advantages such as easier excitation of large‑area, uniform microwave‑plasma spheres, a simpler structure, and ease of fabrication, making it one of the most widely used MPCVD configurations today.
Depending on the cavity sealing method, cylindrical resonant cavities can be classified into quartz bell‑jar resonant cavities and stainless‑steel resonant cavities equipped with circular flat quartz windows.
Due to the absence of contamination from a metallic chamber, quartz‑bell‑type reactors can provide a cleaner diamond‑deposition environment compared with flat‑plate quartz‑window reactors, and their plasma distribution can be tailored through design modifications of the bell‑shaped enclosure. However, in terms of manufacturing cost and thermal management of the quartz windows, the flat‑plate quartz‑window configuration is preferable to the quartz‑bell‑type design, owing to the larger surface area of the bell.
Diamond deposition equipment
Related News
From September 9 to 11, the 27th China International Optoelectronic Exposition (CIOE 2026) was grandly held.
From July 15 to 17, the 14th Western Global Semiconductor Expo (CWICE 2026) was held at the Chengdu Century City New International Convention and Exhibition Center. As a leading domestic player in MPCVD (Microwave Plasma Chemical Vapor Deposition) equipment and high-quality diamond materials, UPL (Youpulai) showcased its proprietary MPCVD systems and premium diamond substrates at the event.
From June 10 to 12, the 2026 Future Industry New Materials Expo (FINE 2026) was held at the Shanghai New International Expo Centre. At the event, UPL made a prominent appearance, presenting its MPCVD (Microwave Plasma Chemical Vapor Deposition) systems alongside comprehensive diamond material solutions for diverse application scenarios. The company engaged with industry peers and downstream customers to explore the innovative uses and future trajectory of diamond in the semiconductor sector.
On April 16–17, the 2026 (Second) Future Semiconductor Industry Innovation Conference was grandly held at Yinsan Lake in Suzhou.
On March 18–19, the 2026 Second Symposium on Fourth-Generation Semiconductor Technology was grandly held in Hangzhou. As a leading enterprise in China’s MPCVD equipment and diamond materials sectors, Uniplasma showcased its core products and technical solutions at the conference, engaging in in-depth exchanges with industry peers and jointly discussing the future of the sector.
On February 28, the unveiling ceremony of Henan Fengyouchuang Materials Technology Co., Ltd. (hereinafter referred to as Henan Fengyouchuang), a joint venture established by Shenzhen Uniplasma and Huanghe Xuanfeng, was solemnly held in Xuchang. Attending the ceremony were Yang Zengjun, Party Secretary and Chairman of the Xuchang Municipal Investment Group; Quan Feng, Chairman of Shenzhen Uniplasma; Chai Bohao, Deputy General Manager of Shenzhen Uniplasma; Du Ping, Deputy Director of the Henan Branch of the China Development Bank; Li Ge, Chairman of Huanghe Xuanfeng; Pang Wenlong, General Manager of Huanghe Xuanfeng, along with other leaders.
New Materials, New Future | Uniplasma showcases at the Carbontech 2025 Carbon Materials Exhibition
On December 11, the 9th International Carbon Materials Conference and Industry Exhibition, Carbontech 2025, concluded successfully at the Shanghai New International Expo Center. At the event, Uniplasma made a prominent appearance with its core technologies and products, bringing together industry peers to discuss new directions and a promising future for the diamond industry.
On November 16, the 27th China Hi-Tech Fair and the Asia Semiconductor and Integrated Circuit Industry Exhibition concluded successfully at the Shenzhen (Bao’an) International Convention and Exhibition Center. At the event, Uniplasma showcased its MPCVD equipment and diamond material products, offering a “core” solution to address the semiconductor industry’s “thermal management crisis” and injecting “core” momentum.