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Dual-chamber system for diamond equipment
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During diamond growth via chemical vapor deposition, the reaction chamber is first evacuated to create a vacuum, after which the reactive gases are introduced. Under the influence of the microwave‑generated electromagnetic field, electrons within the chamber collide with one another, generating intense oscillations that enhance collisions among atoms, functional groups, and molecules. This process results in the chamber being saturated with supersaturated atomic hydrogen and carbon‑containing species. These species continuously undergo adsorption, desorption, migration, diffusion, and deposition on the seed crystal surface, ultimately leading to diamond formation.
Dual-chamber system for diamond equipment
During diamond growth via chemical vapor deposition, the reaction chamber is first evacuated, after which reactive gases are introduced. Under the influence of the microwave‑generated electromagnetic field, electrons within the chamber collide with one another, generating intense oscillations that enhance collisions among atoms, functional groups, and molecules. This leads to a supersaturated environment rich in atomic hydrogen and carbon‑containing species. These species continuously undergo adsorption, desorption, migration, diffusion, and deposition on the seed crystal surface, ultimately forming diamond. In practical production, as diamond growth proceeds over time, thermal vibrations of internal lattice sites and residual stresses can give rise to lattice defects—primarily point defects—either within the diamond or at its surface. To obtain high‑quality diamond, it becomes necessary to open the reactor chamber door, remove the grown diamond, and eliminate these lattice defects. The defect‑free diamond is then returned to the chamber, where, following another vacuum cycle, growth resumes. Repeating this process multiple times is essential for producing high‑quality diamond. However, each such operation requires opening and closing the reactor door, and every opening and closing introduces impurities—such as water vapor from ambient air—into the chamber, which can adversely affect the quality of the growing diamond.
The dual-chamber system of the diamond‑growth apparatus comprises a first chamber, a second chamber, a vacuum slide valve, and a material‑transport mechanism. The vacuum slide valve is rigidly connected between one end of the second chamber and the first chamber, while the material‑transport mechanism is attached to the other end of the second chamber. The mechanism can extend and retract within both chambers. By rigidly coupling one end of the second chamber to the first chamber via the vacuum slide valve and connecting the opposite end of the second chamber to the material‑transport mechanism, the latter is able to move in and out of both chambers. This design overcomes the technical drawback of introducing impurity gases—such as atmospheric moisture—into the resonant cavity during repeated opening and closing of the cavity doors for lattice‑defect removal, thereby enabling the growth of high‑quality diamond.
Diamond equipment
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