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2022
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09
Water-cooling system for diamond equipment
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Since diamond growth requires a specific temperature range, the water-cooling system is a critical component of diamond‑growth equipment, with the substrate‑stage water‑cooling system being particularly important. In such systems, the plasma is positioned above the substrate stage and supplies the energy necessary for the growth of diamond seed crystals. Because diamond growth must be maintained within a narrow temperature window, temperatures that are too high or too low can lead to the formation of impurities such as graphite phases and polycrystalline diamond, which are detrimental to the production of high‑quality diamond.
Water-cooling system for diamond equipment
Since diamond growth requires a specific temperature range, the water‑cooling system is a critical component of diamond‑growth equipment, with the substrate‑stage water‑cooling system being particularly important. In such systems, the plasma is positioned above the substrate stage and supplies the energy necessary for the growth of diamond seed crystals. Because diamond growth must be maintained within a narrow temperature window, temperatures that are too high or too low can lead to the formation of impurities such as graphite and polycrystalline diamond, which are detrimental to the production of high‑quality diamond.
The plasma is positioned above the substrate holder. Due to the plasma’s characteristic—stronger energy in the center and weaker at the edges—the energy density in the central region of the substrate holder exceeds that at the periphery. Consequently, the substrate exhibits a temperature gradient: higher at the center and lower at the edges. This effect becomes more pronounced as microwave power increases and during prolonged operation, compromising the uniformity of the deposited diamond film. Therefore, the water‑cooling system of the diamond deposition equipment is critical. In the substrate holder’s water‑cooling circuit, the cooling water first flows into the central region, where the substrate temperature is highest, thereby cooling the seed crystals on the holder. It then spreads toward the peripheral areas, ensuring that the central region cools faster than the edges. This design maintains all diamond growth on the substrate within a stable temperature range. By circulating the coolant so that it always prioritizes the hotter central zone, even under long‑term operating conditions, the temperature difference between the substrate’s center and its edge remains minimal, resulting in a more uniform temperature distribution across the holder. This, in turn, ensures that diamond film growth on the substrate stays within an optimal temperature window over extended periods.
Diamond equipment
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