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2022
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The History and Present of Diamond Deposition Equipment
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The distinctive feature of MPCVD deposition lies in the fact that its plasma is sustained by microwave energy, allowing the discharge to proceed without metal electrodes. This eliminates the contamination of diamond that can occur in other CVD methods due to electrode use. Furthermore, the gas‑discharge region in MPCVD is highly localized, enabling the generation of a high‑density plasma and the activation of a greater number of reactive species, while also ensuring exceptional discharge stability. These advantages collectively facilitate the long‑term, stable growth of high‑quality diamond. Consequently, MPCVD has long been the preferred technique in the industry for producing both high‑quality single‑crystal and optical‑grade polycrystalline diamond.
The History and Present of Diamond Deposition Equipment
The distinctive feature of MPCVD deposition lies in the fact that its plasma is sustained by microwave energy, allowing the discharge to proceed without metal electrodes. This eliminates the contamination of diamond that can occur in other CVD methods due to electrode use. Furthermore, the gas‑discharge region in MPCVD is highly localized, which not only generates a high‑density plasma and activates a greater number of reactive species but also ensures an exceptionally stable discharge process. These advantages collectively facilitate the long‑term, stable growth of high‑quality diamond. For these reasons, MPCVD has long been the preferred method in the industry for producing both high‑quality single‑crystal and optical‑grade polycrystalline diamond.
In the early stages of developing MPCVD diamond‑film deposition technology, researchers quickly recognized its major drawback: low deposition efficiency. They also understood that overcoming this limitation would hinge on increasing the input power of MPCVD reactors. Since the 1980s, enhancing diamond‑film deposition rates by improving MPCVD reactor designs has remained a central focus of research in this field. To date, depending on the resonant cavity configuration, MPCVD reactors have evolved through several distinct architectures, including quartz‑tube, quartz bell‑jar, cylindrical resonant‑cavity, and annular‑antenna types. Along with these technological advances, the input power of the reactors has increased substantially.
According to international industrial standards, MPCVD systems can operate at two microwave frequencies: 2.45 GHz and 915 MHz. Compared with 2.45 GHz, the 915 MHz microwave has a longer wavelength, generates a larger plasma sphere, and consequently requires higher microwave power. This enables the deposition of diamond films with a greater diameter; specifically, the effective deposition diameter at 915 MHz is approximately 2.67 times that at 2.45 GHz. Owing to these advantages, 915 MHz‑frequency MPCVD equipment can significantly enhance diamond deposition efficiency, shorten the fabrication cycle, and reduce costs, making it highly attractive to industry. However, because 915 MHz systems demand higher power and feature more complex designs and components, they also face substantial challenges in achieving adequate vacuum performance. As a result, their development, manufacturing processes, and overall cost all impose stricter requirements.
Currently, MPCVD diamond‑deposition systems operating at 2.45 GHz and 915 MHz are both capable of producing single‑crystal diamond on a large scale. However, because the deposition environment for single‑crystal diamond is extremely demanding, quartz tubes and quartz bell‑jar MPCVD reactors are now rarely used to avoid contamination caused by plasma‑induced etching of the quartz.
Diamond deposition equipment
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