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2022
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Main components of an MPCVD system
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MPCVD equipment can be broadly divided into four major subsystems: the microwave system, the gas supply and vacuum system, the water-cooling system, and the associated control system.
MPCVD equipment can be broadly divided into four major subsystems: the microwave system, the gas supply and vacuum system, the water-cooling system, and the associated control system.
The microwave system serves as the energy source for MPCVD equipment and constitutes a core component of the entire apparatus; its stable operation is a critical prerequisite for producing high‑quality diamond. Typically, the microwave system comprises the following subsystems: a microwave generator, a microwave transmission line, a microwave power‑control system, and a protection system. Its fundamental principle relies on the interaction between the internal electrons of the magnetron in the microwave generator and a high‑frequency electromagnetic field under a steady orthogonal electromagnetic field configuration, converting energy harvested from a constant electric field into microwave energy to achieve microwave generation.
The gas supply and vacuum systems are the core components of an MPCVD reactor. The vacuum performance of the equipment is a critical process parameter; higher vacuum levels translate into a superior deposition environment and improved deposition quality. Under typical operating conditions, the vacuum system of an MPCVD reactor comprises three main elements: the inlet gas pipeline, the vacuum chamber, and the pumping system. Prior to diamond growth, the vacuum integrity of each component must be ensured.
The water-cooling system is primarily used to regulate the ambient temperature during diamond growth. High‑power microwaves carry substantial energy, and throughout the operation of an MPCVD reactor, most of this energy is dissipated as heat. To ensure the equipment’s long‑term stable performance, a water‑cooling system is indispensable. In MPCVD systems, the water‑cooling system effectively lowers the temperatures of both the reaction chamber and the substrate holder, thereby maintaining diamond growth within a specified temperature range.
The relevant control system is primarily used to regulate various process parameters during the growth phase, such as substrate‑stage height, reactant gas ratios, vacuum pumping and venting operations, microwave power adjustment, and reaction‑chamber temperature control. The control system plays a critical role in the diamond‑growth process.
MPCVD equipment
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