UP-510 clamshell MPCVD equipment
Numbering:
UP-510 series automatic microwave plasma chemical vapor deposition system can be used for the deposition of single crystal diamond, large area single crystal, polycrystalline diamond film and other materials. UP-512 has the characteristics of high reliability, high stability, convenient operation and large deposition area. It is a mature industrial standard equipment and has been used in scientific research in universities and batch industrial production of enterprises. UP-512 series automatic microwave plasma chemical vapor deposition system can be used for the deposition of single crystal diamond, large area single crystal, polycrystalline diamond film and other materials. UP-512 has the characteristics of high reliability, high stability, convenient operation and large deposition area. It is a mature industrial standard equipment and has been used in scientific research in universities and batch industrial production of enterprises.
Description
Technical indicators and characteristics
1.Microwave system (using French Sairem microwave source) | |
Microwave frequency | 2450±25MHz |
Output power | 0.6kw~10kw continuously adjustable |
Two-way coupler | power capacity greater than 15kw, insertion loss less than 0.5dB |
Microwave leakage | 5cm away from the equipment, microwave leakage ≤ 2 mw/cm2 |
2.Vacuum system | |
Working pressure range | 10~300Torr |
Automatic voltage regulation range | 40~250Torr |
Vacuum pump | 6L/s dry pump |
System leak rate | <2×10-10 Torr·L/sec (detected by helium mass spectrometer leak detector) |
Cavity pressure holding capacity | pressure rise less than 0.2 Torr every 24 hours |
Background ultimate vacuum | 0.1Pa (7.5 x10-4 Torr) |
3.Vacuum reaction chamber and substrate stage | |
Reaction chamber material and structure | dish-shaped stainless steel reaction chamber |
Observation window | Four CF ports, 90° distribution. It can be used to measure temperature and observe the reaction chamber |
Motor control, can open and close the cover automatically | |
Molybdenum substrate table diameter | maximum 150mm, recommended diameter range 60mm ~75mm |
The sample table can rotate at a constant speed and move up and down | |
4.Gas path | |
The system comes with five MFC | |
Use flowmeter and flow control valve imported from Japan | |
5.Temperature measurement system | |
Use German brand infrared temperature measurement, range: 300~1300 degrees Celsius | |
6.Software | |
Equipped with 15" touch screen controlled by PLC, user-friendly operation interface, all operations can be done on the touch screen | |
Comes with automatic protection against water shortage, gas shortage, power supply phase loss, fireball jump, over temperature and overload, sparking, etc. | |
The production process is automatically controlled by the process formula, and up to ten sets of process formulas can be set | |
The system comes with preset processes such as automatic air extraction, ignition, heating, cooling, etc., which is easy for users to operate | |
Fully automatic temperature control and air pressure control greatly reduce the workload of system operators | |
7. Hydrogen generator | |
Use American Parker hydrogen generator | |
Hydrogen purity 99.99999%, maximum flow rate 1300sccm |
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